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6英寸SiC晶體品牌
博雅新材產(chǎn)地
四川樣本
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眉山天樂(lè)半導(dǎo)體6英寸SiC晶體產(chǎn)品標(biāo)準(zhǔn) 6-inch SiC Ingot Specification | |||||
序號(hào) Item | 等級(jí) Grade | 精選級(jí)(Z級(jí)) Zero MPD Grade | 工業(yè)級(jí)(P級(jí)) Production Grade | 測(cè)試級(jí)(D級(jí)) Dummy Grade | |
1.晶體參數(shù) Boule Parameters | |||||
1.1 | 晶型 Polytype | 4H-N | |||
1.2 | 表面晶向偏離度 Surface orientation error | Off axis:4.0°toward<11-20>±0.5°,On axis:<0001>±0.5° | |||
2.電學(xué)參數(shù) Electrical Parameters | |||||
2.1 | 摻雜劑 Dopant | Nitrogen | |||
2.2 | 電阻率 Resistivity | 0.015-0.028Ω·cm | |||
3.機(jī)械參數(shù) Mechanical Parameters | |||||
3.1 | 直徑 Diameter | 149.5mm-150.0mm | |||
3.2 | 厚度 Thickness | ≥15mm | |||
3.3 | 主定位邊方向 Primary Flat Orientation | {10-10}±5° | |||
3.4 | 主定位邊長(zhǎng)度 Primary Flat Length | Ingot flat length | 47.5mm±2.0mm | ||
Seed flat length | None | ||||
4.結(jié)構(gòu) Structure | |||||
4.1 | 微管密度 Micropipe density | ≤0.1cm-2 | ≤0.2cm-2 | ≤15cm-2 | |
4.2 | 螺位錯(cuò) TSD | ≤200cm-2 | ≤500cm-2 | ≤1000cm-2 | |
4.3 | 基平面位錯(cuò) BPD | ≤400cm-2 | ≤800cm-2 | / | |
4.4 | 刃位錯(cuò) TED | ≤2000cm-2 | ≤4000cm-2 | / | |
5.晶體質(zhì)量 Ingot Quality | |||||
5.1 | 六方空洞 Hex plate | None | Cumulative area ≤0.1% | ||
5.2 | 劃痕 Scratches | None | Cumulative length ≤1x wafer diameter | ||
5.3 | 缺口/崩邊/裂紋/疵點(diǎn)/沾污 Edge chips/indents/cracks/stains/contamination | None | ≤0.2 mm | <3, ≤1mm width and depth | |
5.4 | 目測(cè)包裹物 Visual carbon inclusion | None | Cumulative area ≤0.05% | Cumulative area ≤3% | |
5.5 | 多型 Polytype areas | None | None | Cumulative area ≤3% | |
6.邊緣輪廓 Edge | |||||
6.1 | 邊緣裂紋 Edge Cracks | None | None | Cumulative length ≤20mm, single length ≤2 mm | |
7.包裝 Packaging | |||||
7.1 | 晶錠標(biāo)記 Ingot Marking(carbon side) | Carbon face label | |||
7.2 | 包裝 Packaging | 單晶錠包裝 Single Ingot Package | |||
Notes: None means no request. |
眉山天樂(lè)半導(dǎo)體6英寸SiC晶體產(chǎn)品標(biāo)準(zhǔn) 6-inch SiC Ingot Specification | |||||
序號(hào) Item | 等級(jí) Grade | 精選級(jí)(Z級(jí)) Zero MPD Grade | 工業(yè)級(jí)(P級(jí)) Production Grade | 測(cè)試級(jí)(D級(jí)) Dummy Grade | |
1.晶體參數(shù) Boule Parameters | |||||
1.1 | 晶型 Polytype | 4H-N | |||
1.2 | 表面晶向偏離度 Surface orientation error | Off axis:4.0°toward <11-20>±0.5°,On axis:<0001>±0.5° | |||
2.電學(xué)參數(shù) Electrical Parameters | |||||
2.1 | 摻雜劑 Dopant | Nitrogen | |||
2.2 | 電阻率 Resistivity | 0.015-0.028Ω·cm | |||
3.機(jī)械參數(shù) Mechanical Parameters | |||||
3.1 | 直徑 Diameter | 149.5mm-150.0mm | |||
3.2 | 厚度 Thickness | ≥15mm | |||
3.3 | 主定位邊方向 Primary Flat Orientation | {10-10}±5° | |||
3.4 | 主定位邊長(zhǎng)度 Primary Flat Length | Ingot flat length | 47.5mm±2.0mm | ||
Seed flat length | None | ||||
4.結(jié)構(gòu) Structure | |||||
4.1 | 微管密度 Micropipe density | ≤0.1cm-2 | ≤0.2cm-2 | ≤15cm-2 | |
4.2 | 螺位錯(cuò) TSD | ≤200cm-2 | ≤500cm-2 | ≤1000cm-2 | |
4.3 | 基平面位錯(cuò) BPD | ≤400cm-2 | ≤800cm-2 | / | |
4.4 | 刃位錯(cuò) TED | ≤2000cm-2 | ≤4000cm-2 | / | |
5.晶體質(zhì)量 Ingot Quality | |||||
5.1 | 六方空洞 Hex plate | None | Cumulative area ≤0.1% | ||
5.2 | 劃痕 Scratches | None | Cumulative length ≤1x wafer diameter | ||
5.3 | 缺口/崩邊/裂紋/疵點(diǎn)/沾污 Edge chips/indents/cracks/stains/contamination | None | ≤0.2 mm | <3, ≤1mm width and depth | |
5.4 | 目測(cè)包裹物 Visual carbon inclusion | None | Cumulative area ≤0.05% | Cumulative area ≤3% | |
5.5 | 多型 Polytype areas | None | None | Cumulative area ≤3% | |
6.邊緣輪廓 Edge | |||||
6.1 | 邊緣裂紋 Edge Cracks | None | None | Cumulative length ≤20mm, single length ≤2 mm | |
7.包裝 Packaging | |||||
7.1 | 晶錠標(biāo)記 Ingot Marking(carbon side) | Carbon face label | |||
7.2 | 包裝 Packaging | 單晶錠包裝 Single Ingot Package | |||
Notes: None means no request. |
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