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英國Nanobean NB5 電子束光刻機(jī)

具有良好的穩(wěn)定性，平均正常運(yùn)行時(shí)間超過93%

規(guī)格:

束流電壓范圍為: 20kV - 100kV

光刻膠的特征尺寸: <8nm (光刻精度)

500um區(qū)域拼接/疊加誤差: 小于25nm

自動(dòng)裝載5卡盤氣鎖系統(tǒng)

NB5發(fā)展目標(biāo):

改進(jìn)設(shè)計(jì)和組件以減少日常服務(wù)需求。

實(shí)現(xiàn)每年少于5%的機(jī)器故障停機(jī)時(shí)間。

提高性能

便于批量生產(chǎn)。

NB5系統(tǒng)將為進(jìn)一步發(fā)展高偏轉(zhuǎn)速度和進(jìn)一步集成電子提供平臺(tái)。

The nB4 is a generation ahead of the current competition and with its field-proven performance has gained acceptance in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB5 which has been developed to further reduce delivery times and service costs.

NB5 development aims:

Refine design and components to reduce routine service requirements.

Achieve a machine-fault-downtime of less than 5% annually.

Enhance performance

Facilitate volume production.

Specification:

Beam Voltage range 20kV - 100kV

Feature size on resist <8nm

Stitching/overlay error <25nm for 500um field

Automatic loading 5 chuck airlock system

The nB5 system will provide a platform for further development to high deflection speed and further integrated electronics.